Surface layers formed upon chamber treatment of copper with octadecylamine

• A.Yu. Luchkin, I.A. Kuznetsov, N.N. Andreev, O.A. Goncharova and S.S. Vesely

A.N. Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, Leninsky pr. 31, 119071 Moscow, Russian Federation

Abstract: The surface layers formed upon chamber treatment of copper with octadecylamine (ODA) vapors have been studied. It has been shown that incorporation of fixed amounts of ODA solutions with different concentrations in ethyl alcohol into the chamber makes it possible to control the inhibitor vapor pressure and study the isotherms of its properties. It has been found that in the absence of octadecylamine and at low pressures of its vapors in the chamber, copper corrosion is inhibited due to blocking of the surface by the oxide film. With increasing vapor pressure of the inhibitor, the degree of surface blocking first decreases and then increases, approaching unity. The presence of a minimum on this plot is due to the fact that ODA adsorbed on the surface at low vapor pressures does not yet form blocking layers but already inhibits the thermal oxidation of copper. Increasing the concentration of ODA in the chamber air leads to a gradual increase in the degree of surface blocking due to the formation of polymolecular adsorption layers. Taking this into account, the plots of the degree of surface blocking on the vapor pressure of ODA in the chamber that were obtained should not be considered as adsorption isotherms.

Keywords: copper, atmospheric corrosion, octadecylamine, vapor phase inhibitors, chamber inhibitors

Int. J. Corros. Scale Inhib., 2024, 13, no. 3, 1715-1723
doi: 10.17675/2305-6894-2024-13-3-21

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